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ECE 620/ECE 655 |
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Course Information |
ECE 620: Pattern Recognition and Machine Intelligence. 3hrs Credits.
Prerequisite: Signals& Linear Systems (ECE 420).
Co-requisite: ECE 655 (1hr)
This class will cover: Fundamentals of Statistical, Structural, and Neural Pattern Recognition Approaches: Parametric and Nonparametric Classification, Feature Extraction, Clustering, Self-organizing Nets for Pattern Recognition, and Formal Languages Representation. Current medical and industrial applications.
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Previous Class Pages
| Spring 2004 |