Summer 2011

ECE 620/ECE 655
Pattern Recognition and Machine Intelligence
Summer 2011

Instructor:
Dr. Aly A. Farag
aly.farag@louisville.edu

Course Information

ECE 620: Pattern Recognition and Machine Intelligence. 3hrs Credits.

Prerequisite: Signals& Linear Systems (ECE 420).
Co-requisite: ECE 655 (1hr)

This class will cover: Fundamentals of Statistical, Structural, and Neural Pattern Recognition Approaches: Parametric and Nonparametric Classification, Feature Extraction, Clustering, Self-organizing Nets for Pattern Recognition, and Formal Languages Representation. Current medical and industrial applications.

Download Course Sysllabus



Lecture
Notes/Handouts

Lecture-1

Lecture-2

Lecture-3

Lecture-4


Lecture-5a

Lecture-5b


Lecture-6

Lecture-7a

Lecture-7b

Lecture-8a

Lecture-8b

Lecture-9

Lecture-10

Lecture-11

Lecture-12

 Lecture-13



Homeworks

Homework 1   

Homework 2

Homework 3 

Homework 4

Projects

Project 1

Project 2

Project 3



Resources

 


Previous Class Pages

Spring 2004

 

 

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